Ion implantation - Wikipedia
网页Ion implantation is a low-temperature process by which ions of one element are accelerated into a solid target, thereby changing the physical, chemical, or electrical properties of the target. Ion implantation is used in semiconductor device fabrication and in metal finishing, as well as in materials science research.
Axcelis | Ion Implantation | Purion Ion Implanters
网页Axcelis Ion implantation systems, built on our next-gen Purion platform, delivers precision, purity, and productivity with the lowest cost of ownership.
Ion Implanters - SpringerLink
网页An ion implanter (see Fig. 2.1) consists of the following major components: an ion source, an extracting and ion analyzing mechanism, an accelerating column, a scanning system and an end station [2.1].
Ion Implants - Semiconductor Engineering
网页2016年5月19日 · Ion implanters, one of the workhorse tools in the fab, are used to inject critical dopants into a device. Ion implantation enables the development of the source/drain and other portions of the chip. There are three main segments in the overall implanter market: high-current; medium-current; and high-energy.
35 Years of challenge and innovation in ion implant
网页2022年11月9日 · The last 35 years have been eventful for the implant industry as it has kept pace with the challenges of the semiconductor roadmap. The engineers and technologists who have supported and designed implanters have driven some remarkable innovations that have enabled and continue to enable this to happen.
Ion implantation technology for silicon carbide - ScienceDirect
网页2016年11月25日 · Ion implantation is a key process technique for semiconductor materials, in particular silicon, for local tailoring of the semiconductor properties. The wide bandgap semiconductor silicon carbide (SiC) features outstanding material properties for high power and high temperature electronic devices, but the properties of SiC also make it ...
Gentler, nanoscale ion implantation | Nature Nanotechnology
网页2024年5月6日 · A key way to realize nanoscale ion implantation is the use of a nanostencil—a stencil made of a pierced atomic force microscope (AFM) tip that chops a focused ion beam using its tiny aperture....
Introduction: Ion implantation technology special issue
网页2023年2月23日 · A good Snapshot Review on basic advances in Ion Implant Equipment is the paper “35 Years of Challenge and Innovation in Ion Implant” by Renau [1]. In this paper, the author reviews significant advances in equipment technology. Of many advances, the author highlights (1) Plasma Flood Gun, (2) Indirectly Heated Cathode Source, (3) Single ...
Ion Implant - Applied Materials
网页Ion implantation (a form of doping) is integral to integrated circuit manufacturing. As the complexity of chips has grown, so has the number of implant steps. Today, a CMOS integrated circuit with embedded memory may require up to 60 implants. Applied’s portfolio comprises the four types of implant systems common in the industry.
网页The use of accelerated ions to dope and modify semiconductor materials, generally called ion implantation, is a core technology for the fabrication of integrated circuits (IC), which form the backbone of the global communications and advanced computation capabilities that have transformed modern life over the last half-century.