Near-field sub-diffraction photolithography with an ... - Nature
网页2020年2月10日 · The combination of near-field capability for sub-diffraction pattern generation with elastomeric characteristic of the mask provides a simple, flexible, and low-cost lithographic tool that has...
Optical and EUV projection lithography: A computational view
网页2015年1月25日 · This article reviews modeling approaches for optical and extreme ultraviolet (EUV) projection lithography. It explains the models for the rigorous computation of light diffraction from lithographic masks, a vector formulation of image formation in projection scanners and models for chemical amplified resists (CAR).
One-Step Mask-Based Diffraction Lithography for the ... - Springer
网页2018年12月5日 · In this study, we demonstrate a novel one-step mask-based diffraction lithography process that is compatible with most kinds of photoresist to fabricate 3D suspended structures. A 3D light intensity distribution is simulated in the photoresist according to Kirchhoff’s diffraction theory and further verified by experiments.
网页Conclusions. 3D mask effects need to be considered in the design of EUV systems, masks and OPC: Orientation dependence: shadowing and contrast fading. Phase deformation: Focus shifts. “Double images”: absorber thickness swings. Mitigation strategies. Illumination shapes and assists. Optimization of absorber material & height.
Coherent diffraction lithography: Periodic patterns via mask …
网页2009年12月3日 · Coherent diffraction lithography (CDL), a mask-based approach, utilizes the well-known Talbot effect to accurately replicate the one- or two-dimentional pattern on a mask by reimaging the mask pattern in photoresist.
Modeling of mask diffraction and projection imaging for …
网页2010年9月20日 · This paper describes several alternative mask models and their integration into a lithography simulation framework. Several examples demonstrate the relevance of an accurate mask diffraction modeling for the prediction of …
Light and matter co-confined multi-photon lithography - Nature
网页2024年3月16日 · Mask-free multi-photon lithography enables the fabrication of arbitrary nanostructures low cost and more accessible than conventional lithography. A major challenge for...
网页Here, we report a photolithography technique that achieves these goals by using an elastomeric photomask with a mechani-cally stable metal absorber that allows reliable conformal contact and thus,...
Modeling of mask diffraction and projection imaging for …
网页2011年3月10日 · This paper reviews advanced mask diffraction and imaging models for the highly accurate and fast simulation of EUV lithography systems, addressing important aspects of the current technical...
Fresnel diffraction mask for optical projection lithography
网页1997年11月1日 · A photomask technology, Fresnel diffraction mask (FDM) is developed in order to extend the usable depth of focus (DOF) in optical lithography on topographic substrates. By using FDM, a focal plane can be controlled. The Fresnel diffraction image near the photomask is reconstructed on a wafer through a projection lens.